연구논문 초록집

초록 검색

세션명 콜로이드 및 분자조립 부문위원회 (I)
발표장 제1회장
논문코드 1L1-7
발표일 2021-04-8
발표시간 16:20-16:45
논문제목 Generation of Complex Nanopatterns with High-aspect ratio and High-resolution, and Their Applications in Directed Self-assembling Template
발표자 정희태
발표자 소속 한국과학기술원
저자 정희태
소속 한국과학기술원
논문초록 The development of large-area, high-resolution nano-patterning with high-aspect-ratios is a challenging problem that must be solved for potential applications in high performance nanoscale devices. To date, soft-, e-beam and soft-building block-lithography have been primarily used in such applications. Here, we describe two new patterning techniques that enables fabrication of ultra high-resolution and high-aspect-ratio patterns of various shapes. First, we introduce an advanced ultrahigh-resolution (~10nm) patterning technique that enables the fabrication of various high aspect ratio of nanostructures. This method provides many strategies to fabricate complex continuous patterns and multi-component patterns with 10 nm-scale. We also introduce a new bottom-down lithography, named dendrimer lithography, where significant progress has been made to generate single domain of supramolecular columnar structure with smaller diameters (~< 5nm), higher area densities in the template.